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The properties of this Innlay™ surface can be further tailored by controlling the depth of embedding. This can be done by selectively varying the ink formulation and deposition and drying conditions.

The upper photo and schematic in Figure 2 show a partially-embedded Ag Nano Wire Network. The lower photo and schematic in Figure 2 show a near-fully-embedded Ag Nano Wire Network.

For TCE applications, the near-fully embedded structure is preferred to obtain protection of the Ag nanowires from environmental degradation while still providing some exposure of the Ag nanowires at the surface for ohmic-contact ease.

For IonArmour® applications, a partially-embedded structure is preferred to enhance the exposure of the antimicrobial particles at the surface to bacteria.
Figure 2

Superior Performance for a Given Particle

The quality of particles plays an important role in any composite. However, the Innlay™ embedding process and resulting structures provide a powerful means of maximizing the efficacy of a given particle in a composite structure.

In the case of TCE films, Innlay™ embedding enables the use of lower AgNW loadings to achieve the same conductivity as conventional, discrete layer structures, which inherently have binder between Ag nanowires, and thereby impede conductivity. This translates to Innlay™ TCE film structures with fewer Ag nanowires that impede and scatter light, and in turn, higher transparencies and lower haze levels for a given sheet resistance.

Moreover, the host polymer of an Innlay™ TCE film provides a dense matrix that encases and protects Ag nanowires from the environment. 

Conventional, discrete-layer silver nanowire composites are fundamentally different. Binder levels in their inks are kept low to minimize the disruption of Ag nanowire junctions and to maintain coatable viscosity levels.  Binder loading is insufficient to produce dense, hermetic matrices for the Ag nanowire composite. Consequently, several additional process steps are required to ensure adequate environmental protection, and in turn, ohmic contact. A polymer over coat is applied and cured to provide environmental protection to the underlying porous, discrete-layer composite of binder and Ag nanowires. The Ag nanowires are now buried under this polymer overcoat. To achieve ohmic contact, an additional etching step is now required to re-expose the Ag nanowires.

Compared to the conventional discrete-layer Ag nanowire coatings, the Innlay™ embedding process and resulting surface structure are inherently simpler, more robust, and lower in cost, while delivering superior optical properties.

For a given antimicrobial particle, the Innlay™ platform delivers superior cost-performance for antimicrobial applications as well.

Figure 3 below illustrates how the IonArmour® platform unrivaled performance than other processes and structures.  Even though the same antimicrobial particles or ingredients are used, IonArmour® surfaces deliver an order-of-magnitude or higher efficacy at killing bacteria.  In case of conventional processes and structures, such as bulk mixtures or discrete-layer coatings (like paint), most of the antimicrobial ingredients s are buried in a matrix and therefore are not available to kill bacteria. In contrast, in a partially-embedded surface structure made by the Innlay™ process, all the antimicrobial particles are exposed on the surface and are active. When compared to any conventional processes and resulting structures, this translates to a dramatic increase in the antimicrobial efficacy and lifetime of IonArmour® surfaces.

Figure 3
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